#HfO2

Applied Physics Express and JJAP

@apexjjap.bsky.social

5 days ago

[Open Access]
Data processing capability of polarization dynamics in ferroelectric-gate transistor-based physical reservoir computing
2025 Appl. Phys. Express 18 081001

iopscience.iop.org/article/10.3...

#APEX
#OpenAccess
#Physics
#ferroelectric
#FET
#computing
#HfO2
#nonlinearity

Applied Physics Express and JJAP

@apexjjap.bsky.social

5 months ago

[OPEN ACCESS]
Defect generation and recovery in high-k HfO2/SiO2/Si stack fabrication
2023 Appl. Phys. Express 16 061004

iopscience.iop.org/article/10.3...

#APEX
#OpenAccess
#Physics
#highk
#HfO2
#SiO2
#Si

Applied Physics Express and JJAP

@apexjjap.bsky.social

5 months ago

[2024 Open Access]
Impact of CeOx layer insertion on ferroelectric properties of Hf-Zr-O films prepared by chemical solution deposition
2024 Jpn. J. Appl. Phys. 63 01SP23

iopscience.iop.org/article/10.3...

#JJAP
#physics
#Openaccess
#ferroelectric
#thinfilms
#HZO
#HfO2
#CeOx
#multivalent
#oxide

Applied Physics Express and JJAP

@apexjjap.bsky.social

7 months ago

[Latest Article : Open Access]
Data processing capability of polarization dynamics in ferroelectric-gate transistor-based physical reservoir computing
2025 Appl. Phys. Express 18 081001

iopscience.iop.org/article/10.3...

#APEX
#OpenAccess
#Physics
#ferroelectric
#FET
#computing
#HfO2
#nonlinearity

Applied Physics Express and JJAP

@apexjjap.bsky.social

7 months ago

[OPEN ACCESS]
Defect generation and recovery in high-k HfO2/SiO2/Si stack fabrication
2023 Appl. Phys. Express 16 061004

iopscience.iop.org/article/10.3...

#APEX
#OpenAccess
#Physics
#highk
#HfO2
#SiO2
#Si